Ultrasonic cleaning device

ABSTRACT

An ultrasonic cleaning device is provided which can easily cope with an increase in a diameter of a cleaning surface of an object to be cleaned. An ultrasonic cleaning device according to the present invention includes an ultrasonic transducer  13  for providing ultrasonic energy to a propagation liquid  15 , an ultrasonic propagation tube  12  for flowing the propagation liquid provided with the ultrasonic energy by the ultrasonic transducer, a holding mechanism disposed below the ultrasonic propagation tube for holding an object to be cleaned  21 , and a cleaning liquid supply mechanism for supplying a cleaning liquid to a cleaning surface of the object to be cleaned held by the holding mechanism, and the ultrasonic propagation tube  12  is disposed so that a side surface thereof may contact a liquid film  19  of the cleaning liquid formed on the cleaning surface by supplying the cleaning liquid to the cleaning surface by the cleaning liquid supply mechanism.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application claims priority from Japanese Patent ApplicationNo. 2008-211977, filed Aug. 20, 2008, the contents of which are hereinincorporated by reference in their entirety.

TECHNICAL FIELD

The present invention relates to an ultrasonic cleaning device bysingle-wafer spin cleaning, an immersion type ultrasonic cleaningdevice, and an ultrasonic cleaning device for cleaning a largesubstrate.

BACKGROUND ART Single-Wafer Spin Cleaning

FIG. 24 is a sectional view illustrating a prior art spot-shower typeultrasonic cleaning device for single-wafer spin cleaning. Thisultrasonic cleaning device is the one for cleaning an object to becleaned 101 having a flat plane such as a semiconductor wafer. Thisdevice has a mechanism (not shown) for spinning the object to be cleaned101 in order to clean the entire surface of the object to be cleaned101, an ultrasonic transducer 103 for providing ultrasonic energy to acleaning liquid, a cleaning-liquid supply port 105 for supplying thecleaning liquid to the ultrasonic transducer 103, a nozzle 104 forinjecting a cleaning liquid 102 provided with the ultrasonic energy tothe object to be cleaned 101 in a spotted manner, and a swing mechanism(not shown) for swinging the nozzle 104 (See Patent Document 1, forexample).

As mentioned above, with the ultrasonic cleaning device shown in FIG.24, since an ultrasonic irradiation region is a point (spot), there hasbeen required a swing mechanism for swinging the nozzle 104 in order toclean the entire surface on the object to be cleaned 101. Also, thelarger a substrate to be cleaned is, the more time it takes for swingingit, and there is a problem that cleaning time of the device cannot bereduced.

Also, in order to reduce a distance between the nozzle 104 and theobject to be cleaned 101, the nozzle 104 needs to be installed in thevicinity on the object to be cleaned 101, which makes workability poor.Also, since an installation space for the nozzle 104 is limited, it isdifficult to install a plurality of nozzles.

For the cleaning liquid, in addition to deionized water and functionalwater in which gas (nitrogen, hydrogen, helium, ozone and the like) toimprove a cleaning effect or gas (carbon dioxide) having an antistaticaction are added to the deionized water, ammonia hydrogen peroxidesolution with the purpose of removing particles, dilute hydrofluoricacid with an etching action, a stripper liquid for removing a resistfilm and the like are used. Since these cleaning liquids pass throughthe inside of the ultrasonic transducer 103, a member resistant againstthe cleaning liquid should be selected for the housing 106, anoscillation plate, the nozzle 104, and a packing, which are portions tocontact the liquid. Also, in order to prevent contamination from themember, cleanliness of each member should be maintained.

FIG. 25 is a sectional view illustrating a prior-art probe (solid rod)type ultrasonic cleaning device for single-wafer spin cleaning. Thisultrasonic cleaning device is a device for cleaning the object to becleaned 101 having a flat plane such as a semiconductor wafer. Thisdevice has a mechanism (not shown) for spinning the object to be cleaned101 in order to clean the entire surface of the object to be cleaned101, a cleaning liquid supply nozzle 107 for supplying a cleaning liquid102 to the surface of the object to be cleaned 101, a probe (solid rod)108 to contact the cleaning liquid 102 supplied to the surface of theobject to be cleaned 101, the ultrasonic transducer 103 for providingultrasonic energy to the probe (solid rod) 108 through a heat transfermember 109, and a coolant supply port 110 and a coolant discharge port111 for supplying and discharging a coolant for cooling the heattransfer member 109 (See Patent Document 2, for example).

In the above-mentioned ultrasonic cleaning device shown in FIG. 25,since the ultrasonic irradiation region is on a line along the probe(solid rod) 108, time required for cleaning the entire surface on theobject to be cleaned 101 can be largely reduced as compared with thespot shower type cleaning device. Also, since a swing mechanism forswinging the probe (solid rod) 108 is not needed, a space required forinstallation of the probe (solid rod) 108 can be reduced.

Also, since a liquid contact portion is only the probe (solid rod) 108,it is only necessary to select a member resistant against the cleaningliquid 102 only for the probe (solid rod) 108. The probe (solid rod) 108is made of an inactive non-contaminant such as quartz, and contaminationfrom the liquid contact portion can be easily prevented.

Also, in order to oscillate the probe (solid rod) 108 formed from asolid material with a high density such as quartz, an acoustically largeload is applied to an oscillating element and causes a large amount ofheat. Thus, with such a probe (solid rod)-type ultrasonic cleaningdevice, energy is propagated to the probe (solid rod) 108 through thethermally conductive member 109 for cooling the ultrasonic transducer103 and the probe (solid rod) 108. Then, in order to efficiently coolthe heat transfer member 109, a coolant passing through the heattransfer member 109 needs to be circulated.

Also, if the probe (solid rod) 108 is oscillated by the drive of theultrasonic transducer 103, standing wave distribution is generated inthe probe (solid rod) 108 as shown in FIG. 26. A wavelength λ of thestanding wave distribution can be calculated as λ=V/F from a sonic speedV and an operating frequency F in the probe (solid rod) 108. If theprobe (solid rod) material is quartz, the sonic speed V=6000 m/s, and inthe case of the operating frequency F=1 MHz, the wavelength λ=6 mm.

Since the sonic speed V and the operating frequency F in the probe(solid rod) 108 have a temperature characteristic, it is necessary tomake temperatures of the probe (solid rod) 108 and the ultrasonictransducer 103 constant in order to maintain the standing wavedistribution in the probe (solid rod) 108. Therefore, coolingtemperature control by a coolant needs to be executed.

Also, in order to form the standing wave distribution, it is necessaryto design the probe length with integral multiple of λ/2. Since thestanding wave distribution is not formed if the probe (solid rod) lengthis varied even slightly, predetermined oscillation amplitude is notobtained if the ultrasonic transducer 103 is driven. Therefore, it isnecessary to manufacture the probe (solid rod) 108 with an accurateprobe length.

Also, the cleaning effect can be obtained at a position of antinodes ofdisplacement amplitude shown in FIG. 26, but the cleaning effect lowersat a position of nodes. An interval between nodes is λ/2=3 mm, and thecleaning effect lowers with the interval of 3 mm.

Also, in the ultrasonic cleaning device shown in FIG. 25, the length ofthe probe (solid rod) 108 needs to be lengthened approximately to aradius of the object to be cleaned 101. Thus, in order to cope with anincrease in diameter of the object to be cleaned 101, the length of theprobe (solid rod) 108 needs to be lengthened accordingly. For example,for a 200-mm wafer, the length of the probe (solid rod) 108 needs to beapproximately 100 mm, and for a 300-mm wafer, the length of the probe(solid rod) 108 needs to be approximately 150 mm. However, the probelength that can be driven is limited, and if the probe (solid rod)reaches certain length, it can no longer be driven due to an acousticload applied to the ultrasonic transducer. Therefore, it is difficult tocope with an increase in diameter larger than the 300-mm wafer with theultrasonic cleaning device in FIG. 25.

-   Patent Document 1: Japanese Patent Laid-Open No. 2007-289807 (FIG.    1)-   Patent Document 2: Japanese Patent No. 3493492 (FIG. 1)

Immersion Type Cleaning

FIG. 27(A) is a sectional view of a prior-art immersion type ultrasoniccleaning device, and FIG. 27(B) is a sectional view obtained by cuttingthe ultrasonic cleaning device in a direction perpendicular to thesection shown in FIG. 27(A).

This ultrasonic cleaning device has a general cleaning tank used in theimmersion type cleaning of a semiconductor wafer and this cleaning tankhas an indirect cleaning structure in which an inner tank 112 filledwith a cleaning liquid is placed on an outer tank (not shown) in whichan ultrasonic transducer 113 is installed on a bottom face. The cleaningliquid is introduced into a jet pipe 114 from a cleaning liquid inlet114 a, and the introduced cleaning liquid is discharged from a sidesurface of the jet pipe 114 into the inner tank 112 as shown by an arrowand is overflowed from the upper part of the inner tank 112.

A wafer as an object to be cleaned 115 installed in the inner tank 112is supported by a carrier (transporting unit) 116 for transportingwafer. Ultrasonic energy is irradiated from the bottom face, but theultrasonic energy hits a receiver portion 116 a in bottom part of thecarrier 116, and there is a problem that a shaded portion in whichultrasonic energy does not reach the wafer is caused or air bubbleswhich adversely affect cleaning efficiency are generated.

Also, since the ultrasonic transducer 113 is installed on the bottomface of the cleaning tank, there is a need to provide a cleaning liquiddrain port 112 a on the side surface of the inner tank 112. If thecleaning liquid drain port 112 a is provided on the side surface, thereis a problem that drainage of the cleaning liquid takes time or thecleaning liquid cannot fully be drained from the inner tank 112.

Large Substrate Cleaning

A substrate size of FPD or a solar cell is getting larger, and asubstrate size can reach even 2.8 m×3.5 m. In the case of a substratewith a size up to 1 m×1 m, the substrate is disposed horizontally, andthe cleaning liquid provided together with ultrasonic energy is ejectedlike line shape shower onto this substrate by so called Ultrasonic LineShower Cleaning Unit. In this way, the substrate is cleaned by thecleaning liquid.

However, as the substrate size gets larger, considering the abovecleaning method for a 1.5 m×1.5 m substrate, for example, the cleaningliquid to be supplied to the substrate needs a large flow rate exceeding100 L/min, the weight of the transducer reaches 18 kg, and as a result,manufacture and installation of the cleaning device becomes extremelydifficult. Therefore, there is a problem that the cleaning device withthe above cleaning method cannot process the substrate size exceeding 1m×1 m.

Also, if the substrate with a size of 1.5 m×1.5 m or more is placedhorizontally, the substrate is deflected by the weight of the dischargedcleaning liquid, and it is foreseen that the liquid cannot be completelydrained or dried.

DISCLOSURE OF THE INVENTION

As described above, with the prior-art probe (solid rod)-type ultrasoniccleaning device for single-wafer spin cleaning and the prior-artultrasonic cleaning device for cleaning large substrates, it isdifficult to cope with an increase in diameter of a cleaning surface ofan object to be cleaned. Thus, the ultrasonic cleaning device isdemanded which can easily cope with an increase in diameter of thecleaning surface of the object to be cleaned.

Also, with the prior-art immersion type ultrasonic cleaning device, theobject to be cleaned 115 supported by the carrier 116 is immersed in acleaning tank 56, and the ultrasonic energy is irradiated from thebottom face of the cleaning tank. Thus, there is a problem that theultrasonic energy hits the receiving portion 116 a in bottom part of thecarrier 116 and does not reach the object to be cleaned. Thus, a newultrasonic cleaning device with which such a problem is not caused iscleaned.

The present invention was made in view of the above circumstances andhas an purpose to solve any of the above-mentioned problems.

In order to solve the above problems, an ultrasonic cleaning deviceaccording to the present invention comprises:

an ultrasonic transducer for providing ultrasonic energy to apropagation liquid;

an ultrasonic propagation tube for flowing the propagation liquidprovided with the ultrasonic energy by the ultrasonic transducer;

a holding mechanism disposed below the ultrasonic propagation tube forholding an object to be cleaned; and

a cleaning liquid supply mechanism for supplying a cleaning liquid to acleaning surface of the object to be cleaned held by the holdingmechanism, and

the ultrasonic propagation tube is disposed so that a side surfacethereof may contact a liquid film of the cleaning liquid formed on thecleaning surface by supplying the cleaning liquid to the cleaningsurface by the cleaning liquid supply mechanism.

According to the above ultrasonic cleaning device, it is possible toprovide the ultrasonic energy to the cleaning liquid supplied to thecleaning surface of the object to be cleaned through the side surface ofthe ultrasonic propagation tube by flowing the propagation liquidprovided with the ultrasonic energy by the ultrasonic transducer throughthe ultrasonic propagation tube. As a result, the cleaning surface ofthe object to be cleaned can be cleaned by the cleaning liquid and theultrasonic energy.

Also, the ultrasonic cleaning device according to the present inventioncan further comprise: a housing for housing one end of the ultrasonicpropagation tube and the ultrasonic transducer placed so as to opposethe one end; a propagation liquid supply device for supplying apropagation liquid into the housing; a dissolved gas concentrationadjuster for adjusting a dissolved gas concentration of the propagationliquid; a propagation liquid recovery tank for recovering thepropagation liquid discharged from the other end of the ultrasonicpropagation tube; and a circulation pump for supplying the propagationliquid in the propagation liquid recovery tank into the housing again.

An ultrasonic cleaning device according to the present inventioncomprises:

an ultrasonic transducer for providing ultrasonic energy to a cleaningliquid;

an ultrasonic propagation tube for flowing the cleaning liquid providedwith the ultrasonic energy by the ultrasonic transducer;

a holding mechanism disposed below the ultrasonic propagation tube forholding an object to be cleaned; and

a slit or a plurality of holes provided on a side wall of the ultrasonicpropagation tube for discharging the cleaning liquid to a cleaningsurface of the object to be cleaned held by the holding mechanism.

The above ultrasonic cleaning device flows the cleaning liquid providedwith the ultrasonic energy by the ultrasonic transducer through theultrasonic propagation tube, and discharges the cleaning liquid from theslit or the plurality of holes provided on the side wall of theultrasonic propagation tube to the cleaning surface of the object to becleaned. As a result, the cleaning surface of the object to be cleanedcan be cleaned by the cleaning liquid and the ultrasonic energy.

Also, in the ultrasonic cleaning device according to the presentinvention, the ultrasonic propagation tube can be disposed so that theside surface thereof may contact a liquid film of the cleaning liquidformed on the cleaning surface by discharging the cleaning liquid to thecleaning surface from the slit or the plurality of holes.

The ultrasonic cleaning device according to the present inventioncomprises:

an ultrasonic transducer for providing ultrasonic energy to apropagation liquid;

an ultrasonic propagation tube for flowing the propagation liquidprovided with the ultrasonic energy by the ultrasonic transducer;

a cleaning liquid supply pipe disposed outside the ultrasonicpropagation tube so as to cover the ultrasonic propagation tube;

a holding mechanism disposed below the cleaning liquid supply pipe forholding an object to be cleaned;

an introduction port provided in the cleaning liquid supply pipe forintroducing a cleaning liquid; and

a slit or a plurality of holes provided on a side wall of the cleaningliquid supply pipe for discharging the cleaning liquid introduced fromthe introduction port to a cleaning surface of the object to be cleanedheld by the holding mechanism.

According to the above ultrasonic cleaning device, it is possible toprovide the ultrasonic energy to the cleaning liquid introduced to thecleaning liquid supply pipe through the side surface of the ultrasonicpropagation tube by flowing the propagation liquid provided with theultrasonic energy by the ultrasonic transducer through the ultrasonicpropagation tube. Then, the cleaning liquid provided with the ultrasonicenergy is discharged from the slit or the plurality of holes to thecleaning surface of the object to be cleaned. As a result, the cleaningsurface of the object to be cleaned can be cleaned by the cleaningliquid and the ultrasonic energy.

Also, in the ultrasonic cleaning device according to the presentinvention, the cleaning liquid supply pipe can be disposed so that aside surface thereof may contact a liquid film of the cleaning liquidformed on the cleaning surface by discharging the cleaning liquid fromthe slit or the plurality of holes to the cleaning surface.

Also, in the ultrasonic cleaning device according to the presentinvention, the ultrasonic transducer is preferably disposed so as tooppose one end of the ultrasonic propagation tube, and a single or aplurality of flange portions is preferably provided at the one end ofthe ultrasonic propagation tube.

Also, in the ultrasonic cleaning device according to the presentinvention, the ultrasonic transducer is preferably disposed so as tooppose one end of the ultrasonic propagation tube, and the one end ofthe ultrasonic propagation tube preferably has a tapered shape in whichan inner diameter of the tube is getting large as getting close to theultrasonic transducer.

Also, in the ultrasonic cleaning device according to the presentinvention, an attenuator for absorbing the ultrasonic energy can beprovided at the other end of the ultrasonic propagation tube.

An ultrasonic cleaning device according to the present inventioncomprises:

an ultrasonic transducer for providing ultrasonic energy to apropagation liquid;

an ultrasonic propagation tube in a double tube structure with an innertube and an outer tube for flowing the propagation liquid provided withthe ultrasonic energy by the ultrasonic transducer, wherein thepropagation liquid is introduced from one end of the inner tube anddischarged from the other end of the inner tube, and the dischargedpropagation liquid passes through the inner surface of the outer tubeand is discharged from a side surface of the outer tube;

a holding mechanism disposed below the ultrasonic propagation tube forholding an object to be cleaned; and

a cleaning liquid supply mechanism for supplying a cleaning liquid to acleaning surface of the object to be cleaned held by the holdingmechanism, and

the ultrasonic propagation tube is disposed so that the outer surface ofthe outer tube may contact a liquid film of the cleaning liquid formedon the cleaning surface by supplying the cleaning liquid to the cleaningsurface by the cleaning liquid supply mechanism.

Also, in the ultrasonic cleaning device according to the presentinvention, the propagation liquid is deionized water and a dissolved gasconcentration in the deionized water is preferably adjusted to 2 to 4.5ppm.

An ultrasonic cleaning device for cleaning an object to be cleaned byimmersing the object in a cleaning liquid within a cleaning tankaccording to the present invention comprises, an ultrasonic transducerfor providing ultrasonic energy to the cleaning liquid;

an ultrasonic propagation tube for flowing the cleaning liquid providedwith the ultrasonic energy by the ultrasonic transducer; and

a slit or a plurality of holes provided on a side wall of the ultrasonicpropagation tube for discharging the cleaning liquid, and

the ultrasonic propagation tube is inserted into the cleaning tank, andthe cleaning liquid is discharged from the slit or the plurality ofholes into the cleaning tank.

The above ultrasonic cleaning device flows the cleaning liquid providedwith the ultrasonic energy by the ultrasonic transducer through theultrasonic propagation tube, and discharges the cleaning liquid from theslit or the plurality of holes provided on the side wall of theultrasonic propagation tube into the cleaning tank. As a result, theobject to be cleaned immersed in the cleaning liquid in the cleaningtank can be cleaned by the cleaning liquid and the ultrasonic energy.

Also, the ultrasonic cleaning device according to the present inventioncan further comprise: a housing for housing one end of the ultrasonicpropagation tube and the ultrasonic transducer disposed so as to opposethe one end;

a cleaning liquid supply device for supplying the cleaning liquid intothe housing;

a dissolved gas concentration adjuster for adjusting a dissolved gasconcentration of the cleaning liquid;

a cleaning liquid recovery tank for recovering the cleaning liquidoverflowed from an upper part of the cleaning device; and

a circulation pump for supplying the cleaning liquid in the cleaningliquid recovery tank into the housing again.

An ultrasonic cleaning device according to the present inventioncomprises:

an ultrasonic transducer for providing ultrasonic energy to a cleaningliquid;

an ultrasonic propagation tube for flowing the cleaning liquid providedwith the ultrasonic energy by the ultrasonic transducer;

a slit or a plurality of holes provided on a side surface of theultrasonic propagation tube for discharging the cleaning liquid;

a holding mechanism for holding an object to be cleaned so as to opposethe slit or the plurality of holes; and

a moving mechanism for relatively moving the object to be cleaned heldby the holding mechanism and the ultrasonic propagation tube, and

the cleaning device cleans the object to be cleaned by discharging thecleaning liquid provided with the ultrasonic energy to the object to becleaned from the slit or the plurality of holes while relatively movingthe object to be cleaned and the ultrasonic propagation tube by themoving mechanism.

Also, in the ultrasonic cleaning device according to the presentinvention, the object to be cleaned can be inclined and held by theholding mechanism.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a sectional view illustrating an ultrasonic cleaning deviceaccording to an embodiment 1 of the present invention.

FIG. 2 is a sectional view enlarging a part of an ultrasonic propagationtube and an object to be cleaned shown in FIG. 1.

FIG. 3 is a sectional view enlarging a part of the ultrasonicpropagation tube and the object to be cleaned shown in FIG. 1.

FIG. 4 is a configuration diagram illustrating a system of theultrasonic cleaning device of the embodiment 1 of the present invention.

FIG. 5 is a graph illustrating a relationship between a dissolved gasconcentration in deionized water and a sound pressure value.

FIG. 6(A) is a sectional view illustrating an ultrasonic propagationtube of an ultrasonic cleaning device according to an embodiment 2 ofthe present invention,

FIG. 6(B) is a view of the ultrasonic propagation tube shown in FIG.6(A) seen from below, and

FIG. 6(C) is a sectional view illustrating a state in which theultrasonic propagation tube shown in FIGS. 6(A) and 6(B) is disposed onthe object to be cleaned during cleaning.

FIG. 7(A) is a sectional view illustrating a variation 1 of theultrasonic propagation tube shown in FIG. 6(A),

FIG. 7(B) is a view of the ultrasonic propagation tube shown in FIG.7(A) seen from below, and

FIG. 7(C) is a sectional view illustrating a state in which theultrasonic propagation tube shown in FIGS. 7(A) and 7(B) is disposed onthe object to be cleaned during cleaning.

FIG. 8 is a sectional view illustrating an ultrasonic propagation tubeaccording to a variation 2.

FIG. 9 is a sectional view illustrating an ultrasonic propagation tubeaccording to a variation 3.

FIGS. 10(A) to 10(C) are sectional views illustrating ultrasonicpropagation tube according to variations 4 to 6, respectively.

FIG. 11 is a sectional view illustrating an ultrasonic propagation tubeaccording to a variation 7.

FIG. 12(A) is a plan view of arrangement of an object to be cleaned andan ultrasonic propagation tube in the ultrasonic cleaning device shownin FIG. 1 seen from above, and

FIGS. 12(B) to 12(D) are plan views illustrating ultrasonic propagationtubes according to variations 8 to 10, respectively.

FIGS. 13(A) to 13(C) are plan views illustrating ultrasonic propagationtubes and objects to be cleaned according to variations 11 to 13 of anembodiment 2, respectively.

FIG. 14(A) is a sectional view illustrating an ultrasonic propagationtube and a cleaning liquid supply mechanism according to a variation 14of the embodiment 1, and

FIG. 14(B) is a sectional view illustrating a state in which theultrasonic propagation tube and the cleaning liquid supply mechanismshown in FIG. 14A are disposed above the object to be cleaned.

FIG. 14(C) is a sectional view illustrating a state in which theultrasonic propagation tube and the cleaning liquid supply mechanism aredisposed above the object to be cleaned.

FIG. 15 is a sectional view illustrating an ultrasonic propagation tubeaccording to a variation 16 of the embodiment 1.

FIG. 16(A) is a sectional view illustrating an immersion-type ultrasoniccleaning device according to an embodiment 3 of the present invention,and

FIG. 16(B) is a sectional view obtained by cutting the ultrasoniccleaning device in a direction perpendicular to the section shown inFIG. 16(A).

FIG. 17 is a configuration diagram illustrating a system of theultrasonic cleaning device of the embodiment 3 of the present invention.

FIG. 18 is a sectional view illustrating an immersion-type ultrasoniccleaning device according to a variation 17 of the embodiment 3.

FIG. 19 is a sectional view illustrating an immersion-type ultrasoniccleaning device according to a variation 18 of the embodiment 3.

FIG. 20 is a sectional view illustrating an immersion-type ultrasoniccleaning device according to a variation 19 of the embodiment 3.

FIG. 21 is a sectional view illustrating an ultrasonic cleaning devicefor cleaning a large substrate according to an embodiment 4 of thepresent invention.

FIG. 22 is a sectional view illustrating an ultrasonic cleaning deviceaccording to a variation 20 of the embodiment 4.

FIG. 23 is a sectional view illustrating an ultrasonic cleaning deviceaccording to a variation 21 of the embodiment 4.

FIG. 24 is a sectional view illustrating a prior-art spot-shower typeultrasonic cleaning device for single-wafer spin cleaning.

FIG. 25 is a sectional view illustrating a prior-art probe (solid rod)type ultrasonic cleaning device for single-wafer spin cleaning.

FIG. 26 is a diagram illustrating a standing wave distributionpropagating in the probe (solid rod) shown in FIG. 25.

FIG. 27(A) is a sectional view illustrating a prior-art immersion typeultrasonic cleaning device, and

FIG. 27(B) is a sectional view obtained by cutting the ultrasoniccleaning device in a direction perpendicular to the section shown inFIG. 27(A).

FIG. 28 is a schematic diagram illustrating a method for measuring asound pressure of this embodiment and a sound pressure of a prior art,respectively.

FIG. 29 is a photo showing an entire device when the sound pressure ofthis embodiment and the sound pressure of the prior art are measured,respectively.

FIG. 30 is a photo showing a tube portion of the device when the soundpressure of this embodiment and the sound pressure of the prior art aremeasured, respectively.

FIG. 31 is a graph illustrating measurement results of the soundpressure of this embodiment and the sound pressure of the prior artmeasured, respectively.

FIG. 32 is a graph for showing oscillation propagation comparisonsimulation of a prior art solid rod and a tube of this invention andillustrates oscillation distribution of ultrasonic propagation tube ofthis invention.

FIG. 33 is a graph for showing oscillation propagation comparisonsimulation of a prior art solid rod and a tube of this invention andillustrates oscillation distribution of a prior art solid rod.

FIG. 34 is a diagram illustrating conditions of the simulation of theultrasonic propagation tube of this invention.

FIG. 35 is a diagram illustrating conditions of the simulation of theprior art solid rod.

EXPLANATION OF REFERENCE NUMERALS

-   -   11 case (housing)    -   12, 37, 40, 42 to 53, 55, 63 ultrasonic propagation tube    -   12 a, 44 a to 46 a rear end portion    -   12 b, 47 b front end portion    -   13 ultrasonic transducer    -   13 a disk-shaped oscillation plate    -   14 propagation liquid supply port    -   15 propagation liquid    -   16 stage    -   17 rotation support portion    -   18 cleaning liquid supply nozzle    -   19, 57 cleaning liquid    -   20 propagation liquid supply device    -   21 object to be cleaned    -   22 dissolved gas concentration adjuster    -   23 temperature adjuster    -   24 flow meter    -   25 joint    -   26 drain tube    -   27 propagation liquid recovery tank    -   28 circulation pump    -   29 filter    -   30 oscillator    -   32 sound pressure sensor    -   33 sound pressure meter    -   34 CPU    -   35 cleaning liquid recovery tank    -   36 drain    -   38 round hole    -   39 cleaning liquid    -   39 a liquid film    -   41 slit (groove)    -   42 a, 42 b tube wall    -   44 b, 45 b flange portion    -   46 b tapered shape    -   47 a attenuator    -   54 cleaning liquid supply pipe    -   54 a introduction port    -   54 b round hole    -   55 a inner tube    -   55 b outer tube    -   55 a 1 distal end (front end portion)    -   55 b 1 distal end (front end portion)    -   55 b 2 discharge port    -   56 cleaning tank    -   56 a drain port    -   58 carrier (transporting unit)    -   58 a receiver portion    -   59 semiconductor wafer    -   60 cleaning liquid inlet    -   61 cleaning liquid recovery tank    -   62 cleaning liquid supply device    -   64 large substrate    -   65 transporting shaft    -   66 transporting roller

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Embodiments of the present invention will be described below in detailusing the attached drawings. However, it is easily understood by thoseskilled in the art that the present invention is not limited to thefollowing description and its modes and details can be modified invarious ways without departing from the gist and scope of the presentinvention. Therefore, the present invention should not be interpretedwith limitation to the described contents of the embodiments shownbelow.

Single-Wafer Spin Cleaning Embodiment 1

FIG. 1 is a sectional view illustrating an ultrasonic cleaning deviceaccording to an embodiment 1 of the present invention. FIGS. 2 and 3 aresectional views enlarging a part of an ultrasonic propagation tube 12and an object to be cleaned 21 shown in FIG. 1.

The ultrasonic cleaning device shown in FIG. 1 has a case (housing) 11,and the ultrasonic propagation tube 12 is mounted at a distal endportion of the case (housing) 11. A material of this ultrasonicpropagation tube 12 is an inactive non-contaminant such as quartz, whichcan easily prevent contamination from a liquid contact portion. Since asolution containing hydrofluoric acid has an action to etch quartz, if asolution containing hydrofluoric acid is to be used as a cleaningliquid, sapphire, silicon carbide or high purity aluminum (Al₂O₃) may beused or quartz coated with a substance resistant against thehydrofluoric acid solution such as silicon carbide, high purity aluminum(Al₂O₃), PFA of fluorine resin and the like may be used as a material ofthe ultrasonic propagation tube 12. Since quartz, sapphire and siliconcarbide are vulnerable to impact and expensive, stainless steel such asSUS316L may be used. If a problem of chemical resistance or elution ofmetal contamination is worried in manufacture of the ultrasonicpropagation tube of stainless steel, electrolytic polishing or surfacemodification processing can be applied to the ultrasonic propagationtube.

Within the case (housing) 11, a disk-shaped ultrasonic transducer 13 isplaced opposing a rear end portion 12 a of the ultrasonic propagationtube 12. This ultrasonic transducer 13 has a disk-shaped oscillationplate 13 a in an integral configuration, and the surface of theoscillation plate 13 a opposes the rear end portion 12 a of theultrasonic propagation tube 12 as an oscillating surface of theultrasonic transducer 13. Also, in a side surface of the case 11, apropagation liquid supply port 14 for supplying a propagation liquid 15for propagating an ultrasonic wave is formed, and deionized water at aroom temperature is preferably used, for example, for the propagationliquid 15.

Also, the ultrasonic cleaning device has a stage 16 for holding anobject to be cleaned 21 having a flat plane such as a semiconductorwafer, and a rotation support portion 17 is mounted below the stage 16.On this rotation support portion 17, a rotating mechanism (not shown)for rotating the rotation support portion 17 is mounted.

Above the stage 16, a cleaning liquid supply nozzle 18 for supplying acleaning liquid 19 is disposed, and the cleaning liquid 19 is suppliedto the surface of the object to be cleaned 21 by this cleaning liquidsupply nozzle 18. The ultrasonic propagation tube 12 contacts thecleaning liquid 19 supplied to the surface of the object to be cleaned21. That is, the ultrasonic propagation tube 12 is disposed at a heightin contact with a liquid film (cleaning liquid) 19 on the surface of theobject to be cleaned 21 and is extended from one outer periphery to theother outer periphery of the object to be cleaned 21. A front endportion 12 b of the ultrasonic propagation tube 12 is disposed outsidethe other outer periphery so that the propagation liquid 15 isdischarged from the front end portion 12 b.

Next, an operation of the ultrasonic cleaning device shown in FIG. 1will be described.

The cleaning device holds object to be cleaned 21 on the stage 16, andsupplies the cleaning liquid 19 to the surface of the object to becleaned 21 from the cleaning liquid supply nozzle 18, while rotating theobject to be cleaned 21 by rotating the stage 16. Also, the cleaningdevice supplies the propagation liquid to the ultrasonic transducer 13inside the case (housing) 11 from the propagation liquid supply port 14,flows the propagation liquid 15 provided with an ultrasonic wave by theultrasonic transducer 13 from the rear end portion 12 a to the front endportion 12 b of the ultrasonic propagation tube 12, and discharges thepropagation liquid 15 from the front end portion 12 b, which is an openend.

A wavelength λ of the ultrasonic wave propagating in deionized water,which is the propagation liquid 15, flowing inside the ultrasonicpropagation tube 12 as shown in FIG. 2 is acquired by λ=V/F from a sonicspeed V=1500 m/s in the deionized water and an operating frequency F=1MHz, and by calculating this, the wavelength λ=1.5 mm is acquired. Thisultrasonic wave repeats reflection and propagates inside the ultrasonicpropagation tube 12 but a part thereof transmits through the ultrasonicpropagation tube 12, propagates in the cleaning liquid 19, and reachesthe object to be cleaned 21. As a result, the surface of the object tobe cleaned 21 is cleaned by the ultrasonic wave and the cleaning liquid19.

In the above embodiment 1, the propagation liquid 15 makes ultrasonicoscillation propagate within it and also works as a refrigerant forremoving heat from the ultrasonic transducer 13. Thus, cooling isperformed efficiently, and since heat is not generated even if largeenergy is given to the ultrasonic transducer 13, the sonic speed V andthe operating frequency F in the propagation liquid 15 having atemperature characteristic can be easily maintained constant.

Also, since the distal end (front end portion 12 b) of the ultrasonicpropagation tube 12 is an open end, as shown in FIG. 3, the ultrasonicwave propagating in the propagation liquid 15 becomes a continuous wave,and standing wave distribution is not caused. Thus, since there is nonode in an oscillation amplitude as in the probe (solid rod)-typeultrasonic cleaning device in FIG. 25, uniform cleaning effects can berealized. Also, since there is no need to accurately determine thelength of the ultrasonic propagation tube, manufacture of the device iseasier as compared with the probe (solid rod)-type ultrasonic cleaningdevice.

Also, even if the ultrasonic propagation tube 12 is made longer in orderto cope with an increase in diameter of the object to be cleaned 21,although the length of the propagation liquid 15 also becomes longer,there is little change in an acoustic load applied to the transducer ofthe deionized water, which is the propagation liquid 15. Thus, there isno limitation on the length of the ultrasonic propagation tube which canbe driven, and a larger diameter of the object to be cleaned 21 can beeasily handled.

Also, in the embodiment 1, since the ultrasonic irradiation region is onthe line along the ultrasonic propagation tube 12, time required forcleaning the entire surface on the object to be cleaned 21 can bedrastically reduced as compared with a point (spot) of the ultrasonicirradiation region of the ultrasonic cleaning device shown in FIG. 24.Also, there are merits that a mechanism for oscillating the ultrasonicpropagation tube 12 is not needed, and the ultrasonic propagation tube12 and the case 11 can be installed without requiring a large space.

Also, a liquid contact portion is only the ultrasonic propagation tube12, and it is only necessary to select a member resistant against thecleaning liquid 19 only for the ultrasonic propagation tube 12. Also, bymaintaining cleanliness of only the ultrasonic propagation tube 12,contamination from the member can be easily prevented.

Also, in the ultrasonic cleaning device of the embodiment 1, ultrasonicoscillation is given to the propagation liquid 15 from the ultrasonictransducer 13, deionized water at a room temperature is used for thepropagation liquid 15, and a density of the deionized water isapproximately 1000 kg/m³, which is smaller than a density of quartz at2200 kg/m³ forming the probe (solid rod) 108 shown in FIG. 25. Thus, anacoustic load applied on the ultrasonic transducer 13 can be madesmaller than that of the device shown in FIG. 25, and heat generation ofthe ultrasonic transducer 13 can be reduced.

Also, there is an obvious difference as follows between the prior-artprobe (solid rod) type ultrasonic cleaning device shown in FIG. 25 andthe ultrasonic cleaning device of this embodiment.

The ultrasonic cleaning device shown in FIG. 25 is a device thatoscillates the probe (solid rod) 108, which is a solid such as quartzand has a high density, by the ultrasonic transducer 103 through a heatconductive member 109 to make the probe (solid rod) itself work as atransducer having standing wave distribution, provides ultrasonic energyto the liquid film (cleaning liquid) 102 in contact with the probe(solid rod) 108 to make the liquid film 102 work as an energypropagation path, and supplies the ultrasonic energy to the object to becleaned.

On the other hand, the ultrasonic cleaning device of this embodiment isa device in which the ultrasonic oscillation energy from the ultrasonictransducer 13 propagates to the propagation liquid 15 in the ultrasonicpropagation tube 12, and the ultrasonic wave in the propagation liquid15 propagates by repeating reflection in the ultrasonic propagation tube12, while a part of ultrasonic wave transmits through the ultrasonicpropagation tube 12, propagates to the cleaning liquid 19 and reachesthe object to be cleaned 21. Therefore, the propagation liquid 15 filledin the ultrasonic propagation tube 12 is a propagation path for theultrasonic energy from the ultrasonic transducer 13 but is not atransducer. The ultrasonic propagation tube 12 has a role to hold thepropagation liquid 15 and to form the propagation path but is not atransducer.

The ultrasonic cleaning device of this embodiment does not providemegasonic energy to a cleaning fluid by the probe (solid rod) 108 asshown in FIG. 25. This will be described below in detail.

In the ultrasonic cleaning device of this embodiment, the propagationliquid 15 provided with an ultrasonic wave flows from the rear endportion 12 a toward the front end portion 12 b of the ultrasonicpropagation tube 12, and a part of the ultrasonic wave propagating inthe propagation liquid 15 transmits through the ultrasonic propagationtube 12 and propagates into the cleaning liquid 19. Therefore, from thefunctional viewpoint, the probe for providing the ultrasonic wave to thecleaning liquid may correspond to the propagation liquid 15 flowingthrough the ultrasonic propagation tube 12.

However, the probe (solid rod) 108 shown in FIG. 25 is a probe made of asolid and not a probe made of a liquid.

Also, the ultrasonic propagation tube 12 of this embodiment does notcorrespond to the probe (solid rod) 108 shown in FIG. 25. This will bedescribed below in detail.

The ultrasonic propagation tube 12 does not contact the oscillationplate 13 a as shown in FIG. 1, and the propagation liquid 15 existsbetween the surface of the oscillation plate 13 a and the rear endportion 12 a of the ultrasonic propagation tube 12. Therefore, theultrasonic wave from the oscillation plate 13 a is not directlytransmitted to the ultrasonic propagation tube 12. Since the ultrasonicpropagation tube 12 does not provide the ultrasonic wave to the cleaningliquid as above, the ultrasonic propagation tube 12 does not correspondto the probe (solid rod) shown in FIG. 25.

Next, a sound pressure when a part of the ultrasonic wave propagating inthe propagation liquid 15 flowing through the ultrasonic propagationtube 12 transmits through the ultrasonic propagation tube 12 andpropagates into the cleaning liquid 19 (hereinafter referred to as“sound pressure of this embodiment”) and a sound pressure when themegasonic energy is provided to the cleaning fluid by the probe (solidrod) 108 shown in FIG. 25 (hereinafter referred to as “sound pressure ofthe prior art”) will be described.

The sound pressure of this embodiment and the sound pressure of theprior art are totally different from each other from the followingreasons.

In this embodiment, since the distal end (front end portion 12 b) of theultrasonic propagation tube 12 is made open for flowing the propagationliquid 15, the ultrasonic wave propagating in the propagation liquid 15becomes a continuous wave having traveling wave distribution, andstanding wave distribution is not caused as shown in FIG. 3. On theother hand, in the probe (solid rod) 108 shown in FIG. 25, since thisprobe (solid rod) 108 is solid, standing wave distribution is caused bya reflective wave from the distal end (free end) of the probe (solidrod).

In order to prove the above contents, an experiment was conducted formeasuring the sound pressure of this embodiment and the sound pressureof the prior art, respectively. The measuring method of the soundpressure is shown in FIG. 28, and photos at the measurement are shown inFIGS. 29 and 30 and the measurement results in FIG. 31.

The measurement conditions are as follows:

water temperature: room temperature (approximately 20° C.)

water quality: deaerated water (DO 1 ppm or less)

flow rate of this invention: 1.0 L/min

tank water supply rate: 5 to 7 L/min

tank capacity: 250×250×400 mm

input power; 30 W

oscillation frequency: 950 kHz

number of measurement times: 2 (average value)

tube diameter: φ6 mm (inner diameter φ4)

As shown in FIG. 31, the sound pressure of this embodiment is confirmedas a continuous wave traveling with a substantially constant amplitude(see 102), while with the sound pressure of the prior art, it isconfirmed that the amplitude has an attenuating tendency but anamplitude value thereof is larger than that of the sound pressure ofthis embodiment and represents standing wave distribution (see 101).That is, if a difference between the minimum amplitude and the maximumamplitude is small, it represents traveling wave distribution, while thedifference between the minimum amplitude and the maximum amplitude islarge, it represents standing wave distribution. With regard to thesound pressure of this embodiment, the difference between the minimumamplitude and the maximum amplitude is small, and it representstraveling wave distribution. Also, the amplitude is substantiallyconstant, and no attenuating tendency is found. With regard to the soundpressure of the prior art, the difference between the minimum amplitudeand the maximum amplitude is large, and it represents standing wavedistribution. Also, the amplitude shows an attenuating tendency.

(attenuation)

probe (solid rod): attenuating from 30 dB to 20 dB

-   -   load is large for quartz horn

tube: constant approximately at 20 dB

-   -   load is small for deionized water tube

(Distribution)

probe (solid rod): distribution is caused

-   -   propagating with standing wave (wavelength: 6 mm)

tube: distribution is not caused

-   -   propagating with traveling wave

Moreover, in order to prove the above contents, simulation was conductedto compare oscillation propagation of the probe (solid rod) shown inFIG. 25 and the oscillation propagation of the propagation liquid 15flowing through the ultrasonic propagation tube 12 of this embodiment,and simulation results are shown in FIGS. 32 and 33 and simulationconditions in FIGS. 34 and 35.

As shown in FIG. 33, in the case of the probe (solid rod) shown in FIG.25, no large difference is found in the oscillation amplitude betweenthe center portion (see 105) and the outer periphery portion (see 106)of the probe (solid rod), and it shows that the oscillation ispropagated in the entire probe (solid rod). On the other hand, as shownin FIG. 32, in the case of this embodiment, it is known that theoscillation is propagated mainly by a medium (water) (see 103).Therefore, the both are fundamentally different in terms of a system ofoscillation propagation. In this way, the sound pressure of thisembodiment is totally different from that of the prior art.

With regard to the cleaning liquid 19, various cleaning liquids can beused depending on the object to be cleaned 21, and other than deionizedwater and functional water in which a gas for improving a cleaningeffect (nitrogen, hydrogen, helium, ozone and the like) or a gas havingan antistatic action (carbon dioxide) is added to deionized water,ammonia hydrogen peroxide solution with the purpose of removingparticles, dilute hydrofluoric acid with an etching action, potassiumchloride (KOH), a stripper liquid for removing a resist film and thelike can be used.

Next, an example in which the ultrasonic cleaning device shown in FIG. 1is systemized will be described referring to FIG. 4. FIG. 4 is aconfiguration diagram illustrating a system of the ultrasonic cleaningdevice of the embodiment 1, and the same reference numerals are given tothe same portions as those in FIG. 1.

As shown in FIG. 4, the propagation liquid supplied from the propagationliquid supply device 20 is supplied to the ultrasonic propagation tube12 through a dissolved gas concentration adjuster 22, a temperatureadjuster 23, and a flow meter 24. Here, it is possible to setcharacteristics (dissolved gas concentration, temperature, and flowrate) of the propagation liquid 15 to conditions suitable for thecleaning.

At a distal end (front end portion 12 b) of the ultrasonic propagationtube 12, a joint 25 and a drain tube 26 are mounted. As a result, thepropagation liquid 15 is fed to a propagation liquid recovery tank 27.The propagation liquid 15 recovered in the propagation liquid recoverytank 27 can be circulated by a circulation pump 28. The propagationliquid 15 having passed through the circulation pump 28 is regeneratedthrough a filter 29. The regenerated propagation liquid 15 is suppliedto the ultrasonic propagation tube 12 through the dissolved gasconcentration adjuster 22, the temperature adjuster 23, and the flowmeter 24, which is the same path as that described above.

Electrical power is supplied to the ultrasonic transducer by theoscillator 30, an ultrasonic wave is provided to the propagation liquidby the ultrasonic transducer, and ultrasonic energy is propagated to thepropagation liquid 15 filled in the ultrasonic propagation tube 12.

The cleaning liquid supplied from the cleaning liquid supply device issupplied onto the ultrasonic propagation tube 12 or onto the object tobe cleaned 21, and a liquid film (cleaning liquid) 19 in contact withthe ultrasonic propagation tube 12 is formed on the object to be cleaned21. At this time, the object to be cleaned 21 is rotated together withthe stage 16. The ultrasonic energy transmitted through the ultrasonicpropagation tube 12 propagates in the cleaning liquid 19 and reaches theobject to be cleaned 21. As a result, the surface of the object to becleaned 21 is cleaned by the ultrasonic wave and the cleaning liquid 19.The cleaning liquid 19 after cleaning is recovered in the cleaningliquid recovery tank 35 and discharged to a drain 36.

A sound pressure sensor 32 is mounted on a side surface of theultrasonic propagation tube 12, and the ultrasonic energy transmittedthrough the ultrasonic propagation tube 12 is detected by this soundpressure sensor 32. Data of the detected ultrasonic energy is sent to asound pressure meter 33 through a CPU 34, converted to a voltage valueat the sound pressure meter 33 and sent to the CPU 34. An output voltagevalue of the oscillator 30 has been also sent to the CPU 34 at the sametime, and if the sound pressure value (voltage value of the ultrasonicenergy) is lower than the output voltage value, it can be determinedthat the ultrasonic energy has been lowered. The characteristics of thepropagation liquid 15 (dissolved gas concentration, temperature, andflow rate) are also sent as data to the CPU 34 from the dissolved gasconcentration adjuster 22, the temperature adjuster 23, and the flowmeter 24, respectively. The CPU 34 can make a control to startoscillation after confirming that the data has reached a predeterminedvalue. As a result, empty operation particularly caused by a loweredflow rate can be prevented.

Depending on the type of the cleaning liquid 19, the temperature may beraised to approximately 70° C., and in that case, in order to maintaincleaning quality, the temperature is preferably kept constant. Thus, byraising the temperature of the propagation liquid 15 to approximately70° C. by the temperature adjuster 23, temperature drop of the cleaningliquid 15 in contact with the ultrasonic propagation tube 12 can beprevented. Temperature rise of the ultrasonic transducer duringoperation is approximately a liquid temperature +20° C. With the liquidtemperature of 70° C., the temperature of the ultrasonic transducerbecomes 90° C. Because an allowable temperature of the ultrasonictransducer is approximately 120° C., there is no problem in use.

FIG. 5 is a graph illustrating a relationship between a dissolved gasconcentration in deionized water and a sound pressure value (voltagevalue of ultrasonic energy). Although the gas concentration dissolved indeionized water as propagation liquid is usually approximately 7 to 8ppm for dissolved oxygen concentration, a high cleaning effect can beobtained as shown in FIG. 5, by adjusting the dissolved oxygenconcentration to 2 to 4.5 ppm (more preferably 2 to 3 ppm) at which ahigh sound pressure value can be obtained. Therefore, with theultrasonic cleaning device shown in FIG. 4, the dissolved gasconcentration adjuster 22 is preferably controlled by the CPU 34 so thatthe dissolved oxygen concentration in the deionized water as thepropagation liquid is adjusted to 2 to 3 ppm.

Embodiment 2

FIG. 6(A) is a sectional view illustrating an ultrasonic propagationtube of an ultrasonic cleaning device according to an embodiment 2 ofthe present invention, FIG. 6(B) is a view of the ultrasonic propagationtube shown in FIG. 6(A) seen from below, and FIG. 6(C) is a sectionalview illustrating a state in which the ultrasonic propagation tube shownin FIGS. 6(A) and 6(B) is arranged on the object to be cleaned 21.

In the ultrasonic cleaning device of the embodiment 1 shown in FIG. 1,the propagation liquid 15 and the cleaning liquid 19 are configured tobe separated from each other, but in the ultrasonic cleaning device ofthe embodiment 2, the cleaning liquid is used as the propagation liquid,and the propagation liquid and the cleaning liquid are configured to bemade common. That is, in the ultrasonic cleaning device according to theembodiment 2, the ultrasonic propagation tube 12 of the ultrasoniccleaning device shown in FIG. 1 is replaced by an ultrasonic propagationtube 37 shown in FIGS. 6(A) to 6(C), and the cleaning liquid supplynozzle 18 is eliminated.

As shown in FIGS. 6A and 6B, round holes 38 aligned in a single row areprovided on a side surface of the ultrasonic propagation tube 37, and asshown in FIG. 6C, the ultrasonic propagation tube 37 is disposed inproximity above the object to be cleaned 21 in the ultrasonic cleaningdevice. In the ultrasonic propagation tube 37, a cleaning liquid 39 as apropagation liquid provided with ultrasonic energy is made to flow, andthe cleaning liquid 39 is discharged onto the object to be cleaned 21through the round holes 38. That is, the ultrasonic energy is dischargedtogether with the cleaning liquid 39 onto the object to be cleaned 21through the round holes 38. As a result, a liquid film 39 a formed fromthe cleaning liquid 39 in contact with the ultrasonic propagation tube37 is formed on the object to be cleaned 21, and the ultrasonic energycleans the object while being supplied to the object to be cleaned 21through the liquid film 39 a.

In the embodiment 2, the effect similar to that of the embodiment 1 canbe also obtained.

Also, since the cleaning liquid is used as the propagation liquid, it isnot necessary to provide a device for supplying the cleaning liquidseparately from the propagation liquid supply device.

(Variation)

FIG. 7(A) is a sectional view illustrating a variation 1 of anultrasonic propagation tube shown in FIG. 6(A), FIG. 7(B) is a view ofthe ultrasonic propagation tube shown in FIG. 7(A) seen from below, andFIG. 7(C) is a sectional view illustrating a state where the ultrasonicpropagation tube shown in FIGS. 7(A) and 7(B) are disposed above theobject to be cleaned 21 for cleaning.

As shown in FIGS. 7(A) and 7(B), a slit (groove) 41 formed on a singleline is provided in a side surface of an ultrasonic propagation tube 40,and as shown in FIG. 7(C), the ultrasonic propagation tube 40 isdisposed above the object to be cleaned 21 in the ultrasonic cleaningdevice, which is farther away from each other as compared with FIG. 6C.In the ultrasonic propagation tube 40, the cleaning liquid 39 as apropagation liquid provided with ultrasonic energy is made to flow, andthe cleaning liquid 39 is discharged onto the object to be cleaned 21through the slit 41. As a result, the ultrasonic energy is supplied tothe object to be cleaned 21 through the cleaning liquid 39 and theobject is cleaned. At this time, since the ultrasonic propagation tube40 and the object to be cleaned 21 are arranged farther away from eachother as compared with FIG. 6C, the ultrasonic propagation tube 40 doesnot contact a liquid film formed from the cleaning liquid 39 on theobject to be cleaned 21.

In the variation 1 also, the effect similar to that of the embodiment 2can be obtained.

Also, the ultrasonic propagation tube 37 shown in FIGS. 6(A) and 6(B)may be disposed so as not to contact the liquid film as shown in FIG.7(C) or the ultrasonic propagation tube 40 shown in FIGS. 7A and 7B maybe disposed so as to contact the liquid film as shown in FIG. 6(C).

FIG. 8 is a sectional view illustrating an ultrasonic propagation tubeaccording to a variation 2. The ultrasonic propagation tubes in each ofthe embodiments 1, 2, and the variation 1 may be changed to anultrasonic propagation tube 42 shown in FIG. 8 and put into practice.This ultrasonic propagation tube 42 has a tube wall 42 a having athickness transmitting an ultrasonic wave and a tube wall 42 b having athickness not transmitting the ultrasonic wave. As a result, in theultrasonic propagation tube 42, a region transmitting the ultrasonicwave and a region not transmitting the one are provided.

FIG. 9 is a sectional view illustrating an ultrasonic propagation tubeaccording to a variation 3. The ultrasonic propagation tubes in each ofthe embodiments 1, 2, and the variation 1 may be changed to anultrasonic propagation tube 43 shown in FIG. 9 and put into practice.This ultrasonic propagation tube 43 has a tube 43 a constructed by amaterial having a density transmitting an ultrasonic wave and a coveringtube 43 b covering a part of the tube 43 a, and the covering tube 43 bis constructed by a material having a density not transmitting theultrasonic wave.

FIGS. 10(A) to 10(C) are sectional views illustrating ultrasonicpropagation tubes according to variations 4 to 6, respectively. Theultrasonic propagation tubes in the embodiments 1, 2, and the variation1 may be changed to ultrasonic propagation tubes 44 to 46 shown in FIGS.10(A) to 10(C), respectively, and put into practice. In the ultrasonicpropagation tubes 44 to 46, each of the distal ends (rear end portions44 a to 46 a) has a shape that causes ultrasonic energy to efficientlypropagate to the ultrasonic transducer 13 having a diameter larger thanan outer diameter of the ultrasonic propagation tube.

At the rear end portion 44 a of the ultrasonic propagation tube 44 shownin FIG. 10(A), a flange portion 44 b is provided so as to oppose theultrasonic transducer 13. By means of this flange portion 44 b, theultrasonic wave is multiply-reflected so that ultrasonic intensity canbe increased.

At the rear end portion 45 a of the ultrasonic propagation tube 45 shownin FIG. 10(B), a plurality of flange portions 45 b is provided so as tooppose the ultrasonic transducer 13. By means of these flange portions45 b, the ultrasonic wave is multiply-reflected so as to increase theultrasonic intensity, while a rectification effect of the propagationliquid can be provided.

The rear end portion 46 a of the ultrasonic propagation tube 46 shown inFIG. 10(C) has a tapered shape 46 b in which a tube inner diameter isgetting larger as getting closer to the ultrasonic transducer 13. Bymeans of this tapered shape 46 b, the ultrasonic wave can be convergedso as to increase the ultrasonic intensity.

FIG. 11 is a sectional view illustrating an ultrasonic propagation tubeaccording to a variation 7. The ultrasonic propagation tube in each ofthe embodiments 1, 2, and the variation 1 may be changed to anultrasonic propagation tube 47 shown in FIG. 11 and put into practice.At a distal end (front end portion 47 b) of this ultrasonic propagationtube 47, an attenuator 47 a for absorbing ultrasonic energy is provided.The ultrasonic wave having reached the attenuator 47 a is not reflectedbut absorbed by the attenuator 47 a, and thereby the ultrasonic wave tobe propagated becomes a continuous wave, and standing wave distributionis not caused. Thus, since a node of an oscillation amplitude asconsidered in the probe (solid rod)-type ultrasonic cleaning device inFIG. 25 is not present, uniformity of the cleaning effect can berealized.

FIG. 12(A) is a plan view of arrangement of the object to be cleaned andthe ultrasonic propagation tube in the ultrasonic cleaning device shownin FIG. 1 when seen from above, and FIGS. 12(B) to 12(D) are plan viewsillustrating ultrasonic propagation tubes according to variations 8 to10, respectively.

As shown in FIG. 12(A), the ultrasonic propagation tube 12 according tothe embodiment 1 has a linearly extending shape. On the other hand, asshown in FIGS. 12(B) to 12(D), the ultrasonic propagation tubes 48 to 50according to the variations 8 to 10 have shapes bent at the center ofthe object to be cleaned 21. In detail, the ultrasonic propagation tube48 shown in FIG. 12(B) is bent at a sharp angle, the ultrasonicpropagation tube 49 shown in FIG. 12(C) is bent at a right angle, andthe ultrasonic propagation tube 50 shown in FIG. 12(D) is bent so as tobe folded back.

According to the variations 8 to 10, since the ultrasonic propagationtube can be manufactured by bending it to various shapes, design freedomin a device whose installation space is limited can be improved.

FIGS. 13(A) to 13(C) are plan views illustrating ultrasonic propagationtubes and objects to be cleaned according to variations 11 to 13 of theembodiment 2. Ultrasonic propagation tubes 51 to 53 according to thevariations 11 to 13 are applied to ultrasonic cleaning devices using thepropagation liquid and the cleaning liquid in common.

As shown in FIGS. 13(A) to 13(C), by disposing outlets of the ultrasonicpropagation tubes 51 to 53 for flowing the cleaning liquid as thepropagation liquid above the objects to be cleaned 21, the cleaningliquid as the propagation liquid can be supplied onto the objects to becleaned 21. Also, similarly to the embodiment 2, a cleaning liquidsupply device from outside is not needed. Also, the ultrasonicpropagation tube can be manufactured with its distal end bent in anarbitrary direction, and a discharging direction of the cleaning liquidcan be determined according to the device.

FIG. 14(A) is a sectional view illustrating an ultrasonic propagationtube and a cleaning liquid supply mechanism according to a variation 14of the embodiment 1, and FIG. 14(B) is a sectional view illustrating astate in which the ultrasonic propagation tube and the cleaning liquidsupply mechanism shown in FIG. 14(A) are arranged above the object to becleaned.

This is a double tube structure in which a cleaning liquid supply pipe54 is disposed outside the ultrasonic propagation tube 12 similar to theembodiment 1 shown in FIG. 1. An introduction port 54 a for introducingthe cleaning liquid 19 is provided at an upper part of the cleaningliquid supply pipe 54, and a round hole 54 b or a slit (groove) isprovided at a lower part of the cleaning liquid supply pipe 54. Thecleaning liquid 19 is introduced into the cleaning liquid supply pipe 54from the introduction port 54 a, and the cleaning liquid 19 in thecleaning liquid supply pipe 54 is discharged onto the object to becleaned 21 through the round hole 54 b or the slit. Since the round hole54 b or the slit is disposed in proximity of the object to be cleaned21, a liquid film 19 a formed from the cleaning liquid 19 in contactwith the cleaning liquid supply pipe 54 is formed on the object to becleaned 21, and the object is cleaned while the ultrasonic energy issupplied to the object to be cleaned 21 through the liquid film 19 a.

FIG. 14(C) is a sectional view illustrating a state in which anultrasonic propagation tube and a cleaning liquid supply mechanismaccording to a variation 15 of the embodiment 1 are arranged above theobject to be cleaned, and the same reference numerals are given to thesame portions as those in FIG. 14(B), and only different portions willbe described.

As shown in FIG. 14(C), the round hole 54 b or the slit of the cleaningliquid supply pipe 54 is disposed with a distance far away from theobject to be cleaned 21. Even with this arrangement, the cleaning liquid19 to which the ultrasonic energy propagated can be supplied to theobject to be cleaned.

FIG. 15 is a sectional view illustrating an ultrasonic propagation tubeaccording to a variation 16 of the embodiment 1. An ultrasonicpropagation tube 55 has a double-tube structure constituted by an innertube 55 a and an outer tube 55 b. A distal end (front end portion) 55 a1 of the inner tube 55 a is open, and a distal end (front end portion)55 b 1 of the outer tube 55 b is closed. On a side wall of the outertube 55 b, a discharge port 55 b 2 for discharging the propagationliquid is provided. As a result, the propagation liquid 15 dischargedfrom the distal end 55 a 1 of the inner tube 55 a can be recovered bythe outer tube 55 b, and the recovered propagation liquid 15 can bedischarged from the discharge port 55 b 2 of the outer tube 55 b. Thatis, the ultrasonic energy discharged together with the propagationliquid 15 from the distal end 55 a 1 of the inner tube 55 a can becirculated on an inner face of the outer tube 55 b, which is anirradiation region, and the ultrasonic energy can be effectively used.Also, the outlet of the propagation liquid 15 can be provided at anarbitrary location of the outer tube 55 b and can be designed accordingto an installation space of the device.

In the ultrasonic cleaning device according to the variation 16, theultrasonic propagation tube 12 of the ultrasonic cleaning device shownin FIG. 1 may be changed to the ultrasonic propagation tube 55 shown inFIG. 15 and put into practice. Also, in the ultrasonic cleaning deviceaccording to the variation 16, the ultrasonic propagation tube 12 of theultrasonic cleaning device shown in FIG. 4 may be changed to theultrasonic propagation tube 55 shown in FIG. 15 and put into practice.In this case, the joint 25 shown in FIG. 4 is mounted at the dischargeport 55 b shown in FIG. 15.

In the variation 16 also, the effect similar to that of the embodiment 2can be obtained.

Immersion-Type Cleaning Embodiment 3

FIG. 16(A) is a sectional view illustrating an immersion-type ultrasoniccleaning device according to an embodiment 3 of the present invention,and FIG. 16(B) is a sectional view obtained by cutting the ultrasoniccleaning device in a direction perpendicular to the section shown inFIG. 16(A).

This ultrasonic cleaning device has a cleaning tank 56 filled with acleaning liquid 57 and is a device in which the cleaning tank 56 isfilled with the cleaning liquid 57 and a carrier (transporting unit) 58holding a plurality of semiconductor wafers 59 as objects to be cleanedis immersed for cleaning in the cleaning liquid 57 in the cleaning tank56.

In the cleaning tank 56, the two ultrasonic propagation tubes 37 shownin FIGS. 6(A) and 6(B) are inserted and mounted. The ultrasonicpropagation tube 40 shown in FIGS. 7(A) and 7(B) may be used in thisembodiment. At a distal end (front end portion) of the ultrasonicpropagation tube 37, the attenuator 47 a for absorbing ultrasonic energysimilar to that in FIG. 11 is mounted, and the attenuator 47 a exertsthe effect similar to that of the variation 7 shown in FIG. 11.

At a base end (rear end portion) of the ultrasonic propagation tube 37,an ultrasonic transducer (not shown) is disposed in an opposing manner,and the ultrasonic transducer is disposed in the housing 11. In thishousing 11, a cleaning liquid inlet 60 is provided.

The cleaning liquid also acting as a propagation liquid is provided withultrasonic energy by the ultrasonic transducer, the cleaning liquid isdischarged into the cleaning tank 56 through the round hole in theultrasonic propagation tube 37 and overflowed from an upper part of thecleaning tank 56, and the overflowed cleaning liquid is recovered by acleaning liquid recovery tank 61.

According to the embodiment 3, since the ultrasonic propagation tube 37is disposed so that the ultrasonic energy can be supplied to thesemiconductor wafer 59, avoiding a receiver portion 58 a of the carrier58, a portion shaded by the receiver portion or generation of airbubbles such as in a prior-art immersion-type ultrasonic cleaning devicecan be suppressed.

Also, since there is no need to provide an oscillation plate as in theprior-art immersion-type ultrasonic cleaning device, a drain port 56 acan be provided on a bottom face of the cleaning tank 56, and time fordischarge can be reduced and the cleaning liquid can be fullydischarged. Also, without newly preparing a cleaning tank, by adding theultrasonic propagation tube 37 to the cleaning tank of the prior-artimmersion-type ultrasonic cleaning device, the ultrasonic cleaningdevice of this embodiment can be realized.

Next, an example in which the ultrasonic cleaning device shown in FIGS.16(A) and 16(B) is systematized will be described referring to FIG. 17.FIG. 17 is a configuration diagram illustrating a system of theultrasonic cleaning device of the embodiment 3, and the same referencenumerals are given to the same portions to those in FIGS. 16(A) and16(B).

As shown in FIG. 17, a cleaning liquid supply device for supplying acleaning liquid also acting as a propagation liquid is supplied to theultrasonic propagation tube 37 through the dissolved gas concentrationadjuster 22, the temperature adjuster 23, the flow meter 24, and thecleaning liquid inlet 60. Here, it is possible to set characteristics(dissolved gas concentration, temperature, flow rate) of the cleaningliquid to conditions suitable for the cleaning.

The cleaning liquid provided with ultrasonic energy is discharged from ahole provided on a side surface of the ultrasonic propagation tube 37,and the cleaning liquid is supplied together with the ultrasonic energyinto the cleaning tank 56. The cleaning liquid 57 in the cleaning tank56 is overflowed from the upper part of the cleaning tank 56, and theoverflowed cleaning liquid is recovered by a cleaning liquid recoverytank 61. The recovered cleaning liquid is circulated by the circulationpump 28 and passed through a filter 29 for regeneration. The regeneratedcleaning liquid is supplied to the ultrasonic propagation tube 37through the dissolved gas concentration adjuster 22, the temperatureadjuster 23, and the flow meter 24, which is the same path as thatdescribed above.

Electrical power is supplied to the ultrasonic transducer by theoscillator 30, an ultrasonic wave is provided to the cleaning liquid bythe ultrasonic transducer, and ultrasonic energy propagates to thecleaning liquid filled in the ultrasonic propagation tube 37.

The sound pressure sensor 32 is mounted on a side surface of theultrasonic propagation tube 37, and the ultrasonic energy transmittedthrough the ultrasonic propagation tube 37 is detected by this soundpressure sensor 32. Data of the detected ultrasonic energy is sent tothe sound pressure meter 33 through the CPU 34, converted to a voltagevalue at the sound pressure meter 33 and sent to the CPU 34. An outputvoltage value of the oscillator 30 is also sent to the CPU 34 at thesame time, and if the sound pressure value (voltage value of theultrasonic energy) is lower than the output voltage value, it can bedetermined that the ultrasonic energy has been lowered. Thecharacteristics of the cleaning liquid 57 (dissolved gas concentration,temperature, flow rate) are also sent as data to the CPU 34 from thedissolved gas concentration adjuster 22, the temperature adjuster 23,and the flow meter 24, respectively. The CPU 34 can control theoscillation to start after confirming that the data has reached apredetermined value. In addition, empty operation caused by a loweredflow rate can be prevented.

If the cleaning liquid 57 is to be replaced, the cleaning liquid in thecleaning tank 56 is discharged from the drain port 56 a and drained tothe drain 36.

Depending on the type of the cleaning liquid 57, the temperature israised to approximately 70° C., and in that case, in order to maintaincleaning quality, the temperature is preferably kept constant. For thispurpose, the temperature of the propagation liquid 57 can be kept atapproximately 70° C. by the temperature adjuster 23. Temperature rise ofthe ultrasonic transducer during operation is approximately a liquidtemperature +20° C. With the liquid temperature of 70° C., thetemperature of the ultrasonic transducer becomes 90° C., but anallowable temperature of the ultrasonic transducer is approximately 120°C., and there is no problem in use.

(Variation)

FIG. 18 is a sectional view illustrating an immersion-type ultrasoniccleaning device according to a variation 17 of the embodiment 3, and thesame reference numerals are given to the same portions as those in FIG.16(A), and only different portions will be described.

An ultrasonic propagation tube 63 is manufactured in a shape bent in themiddle, and an inlet and an outlet for a cleaning liquid acting as apropagation liquid can be provided outside a cleaning tank. That is, inthe ultrasonic cleaning device shown in FIGS. 16(A) and 16(B), amounting hole of the ultrasonic propagation tube 37 is provided in awall face of the cleaning tank 56, and the ultrasonic propagation tube37 is inserted into the cleaning tank 56 through this mounting hole. Onthe other hand, in the variation 17, there is no need to provide amounting hole for the ultrasonic propagation tube in the wall face ofthe cleaning tank 56. Therefore, with this variation, the ultrasonicpropagation tube can be easily added to a cleaning tank without amounting hole.

In the above variation 17 also, the effect similar to that of theembodiment 3 can be obtained.

FIG. 19 is a sectional view illustrating an immersion-type ultrasoniccleaning device according to a variation 18 of the embodiment 3, and thesame reference numerals are given to the same portions as those in FIG.16(B), and only different portions will be described.

By arranging a large number of the ultrasonic propagation tubes 37 inthe cleaning tank 56, a cleaning area can be widened. That is, in theultrasonic cleaning device shown in FIGS. 16(A) and 16(B), the twoultrasonic propagation tubes 37 are disposed in the cleaning tank 56. Inthe variation 18, six ultrasonic propagation tubes 37 are disposed inthe cleaning tank 56.

In the above variation 18 also, the effect similar to that of theembodiment 3 can be obtained.

FIG. 20 is a sectional view illustrating an immersion-type ultrasoniccleaning device according to a variation 19 of the embodiment 3, and thesame reference numerals are given to the same portions as those in FIG.16(B), and only different portions will be described.

In the ultrasonic cleaning device of the variation 19, the ultrasonicpropagation tube 37 is added to the prior-art immersion-type cleaningtank 112 shown in FIG. 27B and used with the oscillation plate 113. Inthis case, by arranging four ultrasonic propagation tubes 37 in thevicinity of the receiver 58 a so that the cleaning liquid provided withthe ultrasonic energy is discharged in the vicinity of the receiver 58a, there is an effect that air bubbles generated in the vicinity of thereceiver 58 a are removed.

Large Substrate Cleaning Embodiment 4

FIG. 21 is a sectional view illustrating an ultrasonic cleaning devicefor cleaning a large substrate according to an embodiment 4 of thepresent invention.

In the ultrasonic cleaning device shown in FIG. 21, the ultrasonicpropagation tube 37 shown in FIGS. 6(A) and 6(B) are used. In thisembodiment, the ultrasonic propagation tube 40 shown in FIGS. 7(A) and7(B) may be also used. At the distal end (front end portion) of theultrasonic propagation tube 37, the attenuator 47 a for absorbingultrasonic energy similar to that in FIG. 11 is mounted, and theattenuator 47 a exerts the effect similar to that of the variation 7shown in FIG. 11.

At a base end (rear end portion) of the ultrasonic propagation tube 37,an ultrasonic transducer (not shown) is disposed in an opposing manner,and the ultrasonic transducer is disposed in the housing 11. In thishousing 11, the cleaning liquid inlet 60 is provided.

The cleaning liquid also acting as a propagation liquid is provided withultrasonic energy by the ultrasonic transducer, and the cleaning liquidis discharged onto the surface of a large substrate 64, which is anobject to be cleaned, through a round hole in the ultrasonic propagationtube 37.

The large substrate 64 is held by a holding mechanism so that a surfacethereof opposes a side surface of the ultrasonic propagation tube 37.This holding mechanism has a plurality of transporting shafts 65arranged with a predetermined interval, a plurality of transportingrollers 66 mounted on the transporting shaft 65, and a rotationmechanism (not shown) for rotating the transporting shafts 65.

By rotating the transporting roller 66 through rotation of thetransporting shaft 65 using the rotation mechanism, the cleaning liquidprovided with the ultrasonic energy is discharged from the plurality ofround holes onto the surface (face to be cleaned) of the large substrate64 as shown by an arrow while the large substrate 64 is moved relativelyto the ultrasonic propagation tube 37. In this way, the surface of thelarge substrate 64 can be cleaned.

If the above ultrasonic cleaning device is applied to the largesubstrate 64 having a size of 1.5 m×1.5 m, a flow rate of the cleaningliquid discharged from the ultrasonic propagation tube 37 can be reducedto approximately 20 L/min, which is ⅕ of that of the prior-artultrasonic cleaning device, and the weight of the ultrasonic transducercan be reduced to approximately 6 kg, which is ⅓ of that of theprior-art ultrasonic cleaning device. Therefore, manufacture andinstallation of the ultrasonic cleaning device becomes extremely easieras compared with the prior-art device.

(Variation)

FIG. 22 is a sectional view illustrating an ultrasonic propagationdevice according to a variation 20 of the embodiment 4, and the samereference numerals are given to the same portions as those in FIG. 21,and only different portions will be described.

Ultrasonic transducers (not shown) are mounted at both ends of theultrasonic propagation tube 37. As a result, ultrasonic energy providedto the cleaning liquid can be increased.

In the above variation 20 also, the effect similar to that of theembodiment 4 can be obtained.

FIG. 23 is a sectional view illustrating an ultrasonic propagationdevice according to a variation 21 of the embodiment 4, and the samereference numerals are given to the same portions as those in FIG. 21,and only different portions will be described.

If the large substrate 64 with a size of 1.5 m×1.5 m or more ishorizontally placed as in the embodiment 4, for example, there is a fearthat the large substrate is deflected by the weight of the dischargedcleaning liquid, and the liquid cannot be completely drained or dried.

Then, since the ultrasonic propagation tube 37 is light-weighted and canbe easily installed even if it is a vertical type, vertical transportingof the large substrate 64 is used. That is, the large substrate 64 isinclined and held by the holding mechanism for transporting. As aresult, the cleaning liquid on the large substrate 64 can be easilydrained after cleaning and can be easily dried.

In the above variation 21 also, the effect similar to that of theembodiment 4 can be obtained.

The present invention is not limited to the above embodiments andvariations but is capable of being put into practice with variouschanges within a scope not departing from the gist of the presentinvention. For example, it is possible to put the present invention intopractice by combining the embodiments and variations as appropriate.

The invention claimed is:
 1. An ultrasonic device comprising: anultrasonic transducer for providing ultrasonic energy to a propagationliquid; an ultrasonic propagation tube for flowing the propagationliquid through the ultrasonic propagation tube, the propagation tubebeing provided with the ultrasonic energy by said ultrasonic transducer;a holding mechanism disposed below said ultrasonic propagation tube forholding an object to be cleaned; and a cleaning liquid supply mechanismfor supplying a cleaning liquid to a cleaning surface of the object tobe cleaned held by said holding mechanism, wherein said ultrasonicpropagation tube is independent and distinct from said cleaning liquidsupply mechanism, and is disposed so that a side surface thereof maycontact a liquid film of the cleaning liquid formed on said cleaningsurface by supplying the cleaning liquid to the cleaning surface by saidcleaning liquid supply mechanism.
 2. The ultrasonic cleaning deviceaccording to claim 1, further comprising: a housing for housing one endof said ultrasonic propagation tube and said ultrasonic transducerplaced so as to oppose the one end; a propagation liquid supply devicefor supplying a propagation liquid into said housing; a dissolved gasconcentration adjuster for adjusting a dissolved gas concentration ofsaid propagation liquid; a propagation liquid recovery tank forrecovering the propagation liquid discharged from the other end of saidultrasonic propagation tube; and a circulation pump for supplying thepropagation liquid in said propagation liquid recovery tank into saidhousing again.
 3. The ultrasonic cleaning device according to claim 1,wherein said ultrasonic transducer is disposed so as to oppose one endof said ultrasonic propagation tube, and a single or a plurality offlange portions is provided at the one end of said ultrasonicpropagation tube.
 4. The ultrasonic cleaning device according to claim1, wherein said ultrasonic transducer is disposed so as to oppose oneend of said ultrasonic propagation tube, and the one end of saidultrasonic propagation tube has a tapered shape in which an innerdiameter of the tube is getting large as getting close to saidultrasonic transducer.
 5. The ultrasonic cleaning device according toclaim 1, wherein an attenuator for absorbing the ultrasonic energy isprovided at an end of said ultrasonic propagation tube.
 6. Theultrasonic cleaning device according to claim 1, wherein: saidultrasonic propagation tube has a double tube structure with an innertube and an outer tube; said propagation liquid is introduced from oneend of said inner tube and discharged from the other end of said innertube, and said discharged propagation liquid passes through the innersurface of said outer tube and is discharged from a side surface of saidouter tube; and said ultrasonic propagation tube is disposed so that theouter surface of said outer tube may contact a liquid film of thecleaning liquid formed on said cleaning surface by supplying thecleaning liquid to the cleaning surface by said cleaning liquid supplymechanism.
 7. The ultrasonic cleaning device according to claim 1,wherein said propagation liquid is deionized water and a dissolved gasconcentration in said deionized water is adjusted to 2 to 4.5 ppm. 8.The ultrasonic cleaning device according to claim 6, wherein saidpropagation liquid is deionized water and a dissolved gas concentrationin said deionized water is adjusted to 2 to 4.5 ppm.